Investigação estrutural de filmes finos de Ti1-xAlxN depositados por magnetron sputtering reativo

• Ano de defesa: 2024
• Autor(a) principal: Dias, Iago Lemos
• Orientador(a): Tentardini, Eduardo Kirinus
• Tipo de documento: Dissertação
• Tipo de acesso: Acesso aberto
• Idioma: por
• Programa de Pós-Graduação: Pós-Graduação em Ciência e Engenharia de Materiais
• Palavras-chave em Português: Filmes finos; Espectroscopia de raio X; Magnetron sputtering; Ti1-xAlxN; Estrutura; Solução sólida; XPS
• Palavras-chave em Inglês: Thin films; Magnetron sputtering; Structure; Solid solution
• Área do conhecimento CNPq: ENGENHARIAS::ENGENHARIA DE MATERIAIS E METALURGICA
• Link de acesso: https://ri.ufs.br/jspui/handle/riufs/19867

Ti1-xAlxN thin films with different Al contents (20, 40 and 60 at.%) were deposited by reactive magnetron sputtering with the aim of studying the structure in which the films are presented, evaluating whether there is formation of a Ti1-xAlxN solid solution or if there is only the presence of two binary nitrides TiN + AlN. The SEM-FEG, nanohardness and oxidation tests at high temperatures were inconclusive to determine the structure of the thin films, however, the GAXRD analyzes of the samples indicated a reduction in the lattice parameter and an increase in the size of the crystallites, providing greater evidence of the formation of Ti1-xAlxN ternary nitride in all coatings from the replacement of Ti by Al in the TiN structure. The XPS results confirmed the presence of the Ti-Al-N chemical bond from the analysis of the Ti 2p, Al 2p and N 1s regions, confirming the formation of the Ti1-xAlxN solid solution in all deposited samples.