Colloidal lithography for photovoltaics

Detalhes bibliográficos
Autor(a) principal: Oliveira, Rui D.
Data de Publicação: 2021
Outros Autores: Mouquinho, Ana, Centeno, Pedro, Alexandre, Miguel, Haque, Sirazul, Martins, Rodrigo, Fortunato, Elvira, Águas, Hugo, Mendes, Manuel J.
Tipo de documento: Outros
Idioma: eng
Título da fonte: Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)
Texto Completo: http://hdl.handle.net/10362/125017
Resumo: DFA/BD/7882/2020
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spelling Colloidal lithography for photovoltaicsAn attractive route for light managementColloidal lithographyLight‐trappingPhotonicsSelf‐cleaningThin‐film photovoltaicsChemical Engineering(all)Materials Science(all)SDG 7 - Affordable and Clean EnergyDFA/BD/7882/2020The pursuit of ever‐more efficient, reliable, and affordable solar cells has pushed the development of nano/micro‐technological solutions capable of boosting photovoltaic (PV) performance without significantly increasing costs. One of the most relevant solutions is based on light management via photonic wavelength‐sized structures, as these enable pronounced efficiency improvements by reducing reflection and by trapping the light inside the devices. Furthermore, optimized microstructured coatings allow self‐cleaning functionality via effective water repulsion, which reduces the accumulation of dust and particles that cause shading. Nevertheless, when it comes to market deployment, nano/micro‐patterning strategies can only find application in the PV industry if their integration does not require high additional costs or delays in high‐throughput solar cell manufacturing. As such, colloidal lithography (CL) is considered the preferential structuring method for PV, as it is an inexpensive and highly scalable soft‐patterning technique allowing nanoscopic precision over indefinitely large areas. Tuning specific parameters, such as the size of colloids, shape, monodispersity, and final arrangement, CL enables the production of various templates/masks for different purposes and applications. This review intends to compile several recent high‐profile works on this subject and how they can influence the future of solar electricity.DCM - Departamento de Ciência dos MateriaisCENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)UNINOVA-Instituto de Desenvolvimento de Novas TecnologiasRUNOliveira, Rui D.Mouquinho, AnaCenteno, PedroAlexandre, MiguelHaque, SirazulMartins, RodrigoFortunato, ElviraÁguas, HugoMendes, Manuel J.2021-09-23T00:52:35Z2021-072021-07-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/otherapplication/pdfhttp://hdl.handle.net/10362/125017eng2079-4991PURE: 32275171https://doi.org/10.3390/nano11071665info:eu-repo/semantics/openAccessreponame:Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)instname:FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiainstacron:RCAAP2024-05-22T17:56:20Zoai:run.unl.pt:10362/125017Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireinfo@rcaap.ptopendoar:https://opendoar.ac.uk/repository/71602025-05-28T17:27:31.564054Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) - FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiafalse
dc.title.none.fl_str_mv Colloidal lithography for photovoltaics
An attractive route for light management
title Colloidal lithography for photovoltaics
spellingShingle Colloidal lithography for photovoltaics
Oliveira, Rui D.
Colloidal lithography
Light‐trapping
Photonics
Self‐cleaning
Thin‐film photovoltaics
Chemical Engineering(all)
Materials Science(all)
SDG 7 - Affordable and Clean Energy
title_short Colloidal lithography for photovoltaics
title_full Colloidal lithography for photovoltaics
title_fullStr Colloidal lithography for photovoltaics
title_full_unstemmed Colloidal lithography for photovoltaics
title_sort Colloidal lithography for photovoltaics
author Oliveira, Rui D.
author_facet Oliveira, Rui D.
Mouquinho, Ana
Centeno, Pedro
Alexandre, Miguel
Haque, Sirazul
Martins, Rodrigo
Fortunato, Elvira
Águas, Hugo
Mendes, Manuel J.
author_role author
author2 Mouquinho, Ana
Centeno, Pedro
Alexandre, Miguel
Haque, Sirazul
Martins, Rodrigo
Fortunato, Elvira
Águas, Hugo
Mendes, Manuel J.
author2_role author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv DCM - Departamento de Ciência dos Materiais
CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)
UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias
RUN
dc.contributor.author.fl_str_mv Oliveira, Rui D.
Mouquinho, Ana
Centeno, Pedro
Alexandre, Miguel
Haque, Sirazul
Martins, Rodrigo
Fortunato, Elvira
Águas, Hugo
Mendes, Manuel J.
dc.subject.por.fl_str_mv Colloidal lithography
Light‐trapping
Photonics
Self‐cleaning
Thin‐film photovoltaics
Chemical Engineering(all)
Materials Science(all)
SDG 7 - Affordable and Clean Energy
topic Colloidal lithography
Light‐trapping
Photonics
Self‐cleaning
Thin‐film photovoltaics
Chemical Engineering(all)
Materials Science(all)
SDG 7 - Affordable and Clean Energy
description DFA/BD/7882/2020
publishDate 2021
dc.date.none.fl_str_mv 2021-09-23T00:52:35Z
2021-07
2021-07-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
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dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/125017
url http://hdl.handle.net/10362/125017
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2079-4991
PURE: 32275171
https://doi.org/10.3390/nano11071665
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