Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests

Detalhes bibliográficos
Autor(a) principal: Silva, Francisco J. G.
Data de Publicação: 2009
Outros Autores: Neto, M. A., Fernandes, A. J. S., Costa, F. M., Oliveira, F. J., Silva, R. F.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)
Texto Completo: http://hdl.handle.net/10400.22/4518
Resumo: Nanocrystalline diamond (NCD) coatings offer an excellent alternative for tribological applications, preserving most of the intrinsic mechanical properties of polycrystalline CVD diamond and adding to it an extreme surface smoothness. Silicon nitride (Si3N4) ceramics are reported to guarantee high adhesion levels to CVD microcrystalline diamond coatings, but the NCD adhesion to Si3N4 is not yet well established. Micro-abrasion tests are appropriate for evaluating the abrasive wear resistance of a given surface, but they also provide information on thin film/substrate interfacial resistance, i.e., film adhesion. In this study, a comparison is made between the behaviour of NCD films deposited by hot-filament chemical vapour deposition (HFCVD) and microwave plasma assisted chemical vapour deposition (MPCVD) techniques. Silicon nitride (Si3N4) ceramic discs were selected as substrates. The NCD depositions by HFCVD and MPCVD were carried out using H2–CH4 and H2–CH4–N2 gas mixtures, respectively. An adequate set of growth parameters was chosen for each CVD technique, resulting in NCD films having a final thickness of 5 m. A micro-abrasion tribometer was used, with 3 m diamond grit as the abrasive slurry element. Experiments were carried out at a constant rotational speed (80 r.p.m.) and by varying the applied load in the range of 0.25–0.75 N. The wear rate for MPCVD NCD (3.7±0.8 × 10−5 m3N−1m−1) is compatible with those reported for microcrystalline CVD diamond. The HFCVD films displayed poorer adhesion to the Si3N4 ceramic substrates than the MPCVD ones. However, the HFCVD films show better wear resistance as a result of their higher crystallinity according to the UV Raman data, despite evidencing premature adhesion failure.
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spelling Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion testsArasive wearAdhesionCVD DiamondNCDSilicon NitrideNanocrystalline diamond (NCD) coatings offer an excellent alternative for tribological applications, preserving most of the intrinsic mechanical properties of polycrystalline CVD diamond and adding to it an extreme surface smoothness. Silicon nitride (Si3N4) ceramics are reported to guarantee high adhesion levels to CVD microcrystalline diamond coatings, but the NCD adhesion to Si3N4 is not yet well established. Micro-abrasion tests are appropriate for evaluating the abrasive wear resistance of a given surface, but they also provide information on thin film/substrate interfacial resistance, i.e., film adhesion. In this study, a comparison is made between the behaviour of NCD films deposited by hot-filament chemical vapour deposition (HFCVD) and microwave plasma assisted chemical vapour deposition (MPCVD) techniques. Silicon nitride (Si3N4) ceramic discs were selected as substrates. The NCD depositions by HFCVD and MPCVD were carried out using H2–CH4 and H2–CH4–N2 gas mixtures, respectively. An adequate set of growth parameters was chosen for each CVD technique, resulting in NCD films having a final thickness of 5 m. A micro-abrasion tribometer was used, with 3 m diamond grit as the abrasive slurry element. Experiments were carried out at a constant rotational speed (80 r.p.m.) and by varying the applied load in the range of 0.25–0.75 N. The wear rate for MPCVD NCD (3.7±0.8 × 10−5 m3N−1m−1) is compatible with those reported for microcrystalline CVD diamond. The HFCVD films displayed poorer adhesion to the Si3N4 ceramic substrates than the MPCVD ones. However, the HFCVD films show better wear resistance as a result of their higher crystallinity according to the UV Raman data, despite evidencing premature adhesion failure.American Scientific PublishersREPOSITÓRIO P.PORTOSilva, Francisco J. G.Neto, M. A.Fernandes, A. J. S.Costa, F. M.Oliveira, F. J.Silva, R. F.2014-06-06T11:22:17Z20092009-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.22/4518eng10.1166/jnn.2009.NS93info:eu-repo/semantics/openAccessreponame:Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)instname:FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiainstacron:RCAAP2025-03-07T10:25:33Zoai:recipp.ipp.pt:10400.22/4518Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireinfo@rcaap.ptopendoar:https://opendoar.ac.uk/repository/71602025-05-29T00:53:41.713679Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) - FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiafalse
dc.title.none.fl_str_mv Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
title Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
spellingShingle Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
Silva, Francisco J. G.
Arasive wear
Adhesion
CVD Diamond
NCD
Silicon Nitride
title_short Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
title_full Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
title_fullStr Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
title_full_unstemmed Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
title_sort Adhesion and wear behaviour of NCD coatings on Si3N4 by micro-abrasion tests
author Silva, Francisco J. G.
author_facet Silva, Francisco J. G.
Neto, M. A.
Fernandes, A. J. S.
Costa, F. M.
Oliveira, F. J.
Silva, R. F.
author_role author
author2 Neto, M. A.
Fernandes, A. J. S.
Costa, F. M.
Oliveira, F. J.
Silva, R. F.
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv REPOSITÓRIO P.PORTO
dc.contributor.author.fl_str_mv Silva, Francisco J. G.
Neto, M. A.
Fernandes, A. J. S.
Costa, F. M.
Oliveira, F. J.
Silva, R. F.
dc.subject.por.fl_str_mv Arasive wear
Adhesion
CVD Diamond
NCD
Silicon Nitride
topic Arasive wear
Adhesion
CVD Diamond
NCD
Silicon Nitride
description Nanocrystalline diamond (NCD) coatings offer an excellent alternative for tribological applications, preserving most of the intrinsic mechanical properties of polycrystalline CVD diamond and adding to it an extreme surface smoothness. Silicon nitride (Si3N4) ceramics are reported to guarantee high adhesion levels to CVD microcrystalline diamond coatings, but the NCD adhesion to Si3N4 is not yet well established. Micro-abrasion tests are appropriate for evaluating the abrasive wear resistance of a given surface, but they also provide information on thin film/substrate interfacial resistance, i.e., film adhesion. In this study, a comparison is made between the behaviour of NCD films deposited by hot-filament chemical vapour deposition (HFCVD) and microwave plasma assisted chemical vapour deposition (MPCVD) techniques. Silicon nitride (Si3N4) ceramic discs were selected as substrates. The NCD depositions by HFCVD and MPCVD were carried out using H2–CH4 and H2–CH4–N2 gas mixtures, respectively. An adequate set of growth parameters was chosen for each CVD technique, resulting in NCD films having a final thickness of 5 m. A micro-abrasion tribometer was used, with 3 m diamond grit as the abrasive slurry element. Experiments were carried out at a constant rotational speed (80 r.p.m.) and by varying the applied load in the range of 0.25–0.75 N. The wear rate for MPCVD NCD (3.7±0.8 × 10−5 m3N−1m−1) is compatible with those reported for microcrystalline CVD diamond. The HFCVD films displayed poorer adhesion to the Si3N4 ceramic substrates than the MPCVD ones. However, the HFCVD films show better wear resistance as a result of their higher crystallinity according to the UV Raman data, despite evidencing premature adhesion failure.
publishDate 2009
dc.date.none.fl_str_mv 2009
2009-01-01T00:00:00Z
2014-06-06T11:22:17Z
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dc.identifier.uri.fl_str_mv http://hdl.handle.net/10400.22/4518
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dc.language.iso.fl_str_mv eng
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dc.relation.none.fl_str_mv 10.1166/jnn.2009.NS93
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dc.publisher.none.fl_str_mv American Scientific Publishers
publisher.none.fl_str_mv American Scientific Publishers
dc.source.none.fl_str_mv reponame:Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)
instname:FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologia
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reponame_str Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)
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