An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition
| Autor(a) principal: | |
|---|---|
| Data de Publicação: | 2012 |
| Outros Autores: | , , , |
| Tipo de documento: | Artigo |
| Idioma: | eng |
| Título da fonte: | Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) |
| Texto Completo: | https://doi.org/10.1016/j.apsusc.2011.10.079 |
Resumo: | C. A. A. Ghumman gratefully thanks the Portuguese Foundation for Science and Technology – Fundação para a Ciência e a Tecnologia (Grant No. SFRH/BD/44558/2008) for the financial support of this research. |
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An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium depositionElectronegativityIII-V semiconductorsNeutral cesium depositionSecondary ion yield enhancementTOF-SIMSWork functionSurfaces, Coatings and FilmsC. A. A. Ghumman gratefully thanks the Portuguese Foundation for Science and Technology – Fundação para a Ciência e a Tecnologia (Grant No. SFRH/BD/44558/2008) for the financial support of this research.A TOF-SIMS VG Ionex IX23LS with upgraded data acquisition and control system was used to study the secondary emission of negative atomic and cluster ions of non-metallic elements (P, As and Sb) upon a 19 keV Ga + bombardment of non-degenerated III-V semiconductors (GaP, GaAs, GaSb, InP, InAs and InSb) with prior neutral Cs deposition from a getter dispenser. It was found that surface cesiation enhances the peak intensity of all negative ion species; in the case of atomic ions, the greatest increase (360) was observed for P - emitted from InP. Such an enhancement was larger for In-based than for Ga-based compounds. We explained that in terms of an electronegativity difference between the composing atoms of III-V semiconductors. The greater electronegativity difference (bond ionicity) of In-based compounds resulted in the greater Cs-induced work function decrease leading to a higher increase in the ionization probability of secondary ions.CeFITec – Centro de Física e Investigação TecnológicaDF – Departamento de FísicaRUNGhumman, C. A. A.Moutinho, A. M. C.Santos, A.Teodoro, O. M. N. D.Tolstogouzov, A.2019-07-29T22:28:16Z2012-01-152012-01-15T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article8application/pdfhttps://doi.org/10.1016/j.apsusc.2011.10.079eng0169-4332PURE: 6475511http://www.scopus.com/inward/record.url?scp=84855541822&partnerID=8YFLogxKhttps://doi.org/10.1016/j.apsusc.2011.10.079info:eu-repo/semantics/openAccessreponame:Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)instname:FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiainstacron:RCAAP2024-05-22T17:40:29Zoai:run.unl.pt:10362/76908Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireinfo@rcaap.ptopendoar:https://opendoar.ac.uk/repository/71602025-05-28T17:11:29.530917Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) - FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiafalse |
| dc.title.none.fl_str_mv |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| title |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| spellingShingle |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition Ghumman, C. A. A. Electronegativity III-V semiconductors Neutral cesium deposition Secondary ion yield enhancement TOF-SIMS Work function Surfaces, Coatings and Films |
| title_short |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| title_full |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| title_fullStr |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| title_full_unstemmed |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| title_sort |
An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium deposition |
| author |
Ghumman, C. A. A. |
| author_facet |
Ghumman, C. A. A. Moutinho, A. M. C. Santos, A. Teodoro, O. M. N. D. Tolstogouzov, A. |
| author_role |
author |
| author2 |
Moutinho, A. M. C. Santos, A. Teodoro, O. M. N. D. Tolstogouzov, A. |
| author2_role |
author author author author |
| dc.contributor.none.fl_str_mv |
CeFITec – Centro de Física e Investigação Tecnológica DF – Departamento de Física RUN |
| dc.contributor.author.fl_str_mv |
Ghumman, C. A. A. Moutinho, A. M. C. Santos, A. Teodoro, O. M. N. D. Tolstogouzov, A. |
| dc.subject.por.fl_str_mv |
Electronegativity III-V semiconductors Neutral cesium deposition Secondary ion yield enhancement TOF-SIMS Work function Surfaces, Coatings and Films |
| topic |
Electronegativity III-V semiconductors Neutral cesium deposition Secondary ion yield enhancement TOF-SIMS Work function Surfaces, Coatings and Films |
| description |
C. A. A. Ghumman gratefully thanks the Portuguese Foundation for Science and Technology – Fundação para a Ciência e a Tecnologia (Grant No. SFRH/BD/44558/2008) for the financial support of this research. |
| publishDate |
2012 |
| dc.date.none.fl_str_mv |
2012-01-15 2012-01-15T00:00:00Z 2019-07-29T22:28:16Z |
| dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
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info:eu-repo/semantics/article |
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article |
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publishedVersion |
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https://doi.org/10.1016/j.apsusc.2011.10.079 |
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https://doi.org/10.1016/j.apsusc.2011.10.079 |
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eng |
| language |
eng |
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0169-4332 PURE: 6475511 http://www.scopus.com/inward/record.url?scp=84855541822&partnerID=8YFLogxK https://doi.org/10.1016/j.apsusc.2011.10.079 |
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info:eu-repo/semantics/openAccess |
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openAccess |
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8 application/pdf |
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