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Análise do desenvolvimento de filme de líquido em escoamento ascendente sob efeito dos campos centrífugo e gravitacional

Detalhes bibliográficos
Ano de defesa: 2017
Autor(a) principal: Eidt, Henrique Krainer
Orientador(a): Não Informado pela instituição
Banca de defesa: Não Informado pela instituição
Tipo de documento: Dissertação
Tipo de acesso: Acesso aberto
Idioma: por
Instituição de defesa: Universidade Tecnológica Federal do Paraná
Curitiba
Brasil
Programa de Pós-Graduação em Engenharia Mecânica e de Materiais
UTFPR
Programa de Pós-Graduação: Não Informado pela instituição
Departamento: Não Informado pela instituição
País: Não Informado pela instituição
Palavras-chave em Português:
Link de acesso: http://repositorio.utfpr.edu.br/jspui/handle/1/2842
Resumo: Flows with free surface compose an important class of two-phase flows in the fluids mechanics. In various applications a thin film of liquid builds up on horizontal or vertical surfaces. This type of flow is denominated as liquid film flow. The present work contemplates the analysis of the development of liquid film in ascendant flow under the action of the centrifugal and gravitational fields, located in a cyclonic chamber of a distribution system. In the study, the dynamics of a liquid film flow were analyzed with the aid of three-dimensional and transient numerical simulations. The numerical model developed was validated based on experimental data provided by NUEM (Centre for Multiphase Flows). In the numerical modeling of the flow, were used the EulerianEulerian two fluid model coupled with the compressive discretization scheme for the capture of the liquid-gas interface and the Shear Stress Transport turbulence model. The balance equations were discretized using the finite volume based on finite elements method. Numerical simulations were supported by the commercial software ANSYS-CFX 15.0. The results obtained in this work enabled the understanding of flow dynamics (formation, spreading, stability and development) and how the superficial velocities of liquid and gas (0.5, 1.0, 1.5 and 2.0 m/s for both phases) influence on the stability and behavior of the ascendant liquid film flow. A mathematical model capable of providing conditions that represent the average behavior of a slug flow pattern was also elaborate.