Showing 1 - 5 results of 5 for search '(( decrease during decrease to decrease ) OR ( decrease not decrease sputtering effect ))~', query time: 0.95s Refine Results
1
Published 2004
... da dose total dos íons é efetivamente implantada, devido ao processo de sputtering, que ocorre durante...
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Doctoral thesis
2
Published 2015
... sample holder ?; magnetic field application during deposition HD; substrate temperature TS] on the values...
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Doctoral thesis
3
Published 2014
... decreases and functionalization increases in the modern electronics further size reduction is getting...
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