Amorphous carbon thin films
| Main Author: | |
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| Publication Date: | 2023 |
| Other Authors: | , , , , , , , , , , , |
| Format: | Article |
| Language: | eng |
| Source: | Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) |
| Download full: | http://hdl.handle.net/10362/159761 |
Summary: | Publisher Copyright: © 2023 Author(s). |
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Amorphous carbon thin filmsMechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emissionCondensed Matter PhysicsSurfaces and InterfacesSurfaces, Coatings and FilmsPublisher Copyright: © 2023 Author(s).Amorphous carbon (a-C) films, having low secondary electron yield (SEY), are used at CERN to suppress electron multipacting in the beam pipes of particle accelerators. It was already demonstrated that hydrogen impurities increase the SEY of a-C films. In this work, a systematic characterization of a set of a-C coatings, deliberately contaminated by deuterium during the magnetron sputtering deposition, by scanning electron microscopy, ion beam analysis, secondary ion mass spectrometry, and optical absorption spectroscopy was performed to establish a correlation between the hydrogen content and the secondary electron emission properties. In parallel, the mechanisms of contamination were also investigated. Adding deuterium allows resolving the contributions of intentional and natural contamination. The results enabled us to quantify the relative deuterium/hydrogen (D/H) amounts and relate them with the maximum SEY (SEYmax). The first step of incorporation appears to be formation of D/H atoms in the discharge. An increase in both the flux of deposited carbon atoms and the discharge current with a D2 fraction in the gas discharge can be explained by target poisoning with deuterium species followed by etching of CxDy clusters, mainly by physical sputtering. For overall relative D/H amounts between 11% and 47% in the discharge gas, the SEYmax increases almost linearly from 0.99 to 1.38. An abrupt growth of SEYmax from 1.38 to 2.12 takes place in the narrow range of D/H relative content of 47%-54%, for which the nature of the deposited films changes to a polymer-like layer.DF – Departamento de FísicaCeFITec – Centro de Física e Investigação TecnológicaDCM - Departamento de Ciência dos MateriaisCENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)RUNAdame, C. F.Alves, E.Barradas, N. P.Costa Pinto, P.Delaup, Y.Ferreira, I. M. M.Neupert, H.Himmerlich, M.Pfeiffer, S.Rimoldi, M.Taborelli, M.Teodoro, O. M. N. D.Bundaleski, N.2023-11-09T22:09:04Z2023-072023-07-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article13application/pdfhttp://hdl.handle.net/10362/159761eng0734-2101PURE: 75754497https://doi.org/10.1116/6.0002759info:eu-repo/semantics/openAccessreponame:Repositórios Científicos de Acesso Aberto de Portugal (RCAAP)instname:FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiainstacron:RCAAP2024-05-22T18:15:33Zoai:run.unl.pt:10362/159761Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireinfo@rcaap.ptopendoar:https://opendoar.ac.uk/repository/71602025-05-28T17:46:19.841640Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) - FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologiafalse |
| dc.title.none.fl_str_mv |
Amorphous carbon thin films Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission |
| title |
Amorphous carbon thin films |
| spellingShingle |
Amorphous carbon thin films Adame, C. F. Condensed Matter Physics Surfaces and Interfaces Surfaces, Coatings and Films |
| title_short |
Amorphous carbon thin films |
| title_full |
Amorphous carbon thin films |
| title_fullStr |
Amorphous carbon thin films |
| title_full_unstemmed |
Amorphous carbon thin films |
| title_sort |
Amorphous carbon thin films |
| author |
Adame, C. F. |
| author_facet |
Adame, C. F. Alves, E. Barradas, N. P. Costa Pinto, P. Delaup, Y. Ferreira, I. M. M. Neupert, H. Himmerlich, M. Pfeiffer, S. Rimoldi, M. Taborelli, M. Teodoro, O. M. N. D. Bundaleski, N. |
| author_role |
author |
| author2 |
Alves, E. Barradas, N. P. Costa Pinto, P. Delaup, Y. Ferreira, I. M. M. Neupert, H. Himmerlich, M. Pfeiffer, S. Rimoldi, M. Taborelli, M. Teodoro, O. M. N. D. Bundaleski, N. |
| author2_role |
author author author author author author author author author author author author |
| dc.contributor.none.fl_str_mv |
DF – Departamento de Física CeFITec – Centro de Física e Investigação Tecnológica DCM - Departamento de Ciência dos Materiais CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N) RUN |
| dc.contributor.author.fl_str_mv |
Adame, C. F. Alves, E. Barradas, N. P. Costa Pinto, P. Delaup, Y. Ferreira, I. M. M. Neupert, H. Himmerlich, M. Pfeiffer, S. Rimoldi, M. Taborelli, M. Teodoro, O. M. N. D. Bundaleski, N. |
| dc.subject.por.fl_str_mv |
Condensed Matter Physics Surfaces and Interfaces Surfaces, Coatings and Films |
| topic |
Condensed Matter Physics Surfaces and Interfaces Surfaces, Coatings and Films |
| description |
Publisher Copyright: © 2023 Author(s). |
| publishDate |
2023 |
| dc.date.none.fl_str_mv |
2023-11-09T22:09:04Z 2023-07 2023-07-01T00:00:00Z |
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info:eu-repo/semantics/publishedVersion |
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info:eu-repo/semantics/article |
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article |
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publishedVersion |
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http://hdl.handle.net/10362/159761 |
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http://hdl.handle.net/10362/159761 |
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eng |
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eng |
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0734-2101 PURE: 75754497 https://doi.org/10.1116/6.0002759 |
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info:eu-repo/semantics/openAccess |
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openAccess |
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13 application/pdf |
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Repositórios Científicos de Acesso Aberto de Portugal (RCAAP) - FCCN, serviços digitais da FCT – Fundação para a Ciência e a Tecnologia |
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info@rcaap.pt |
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